ADVANCES IN FABRICATION TECHNIQUES OF EPITAXIAL SILICON P-N STRUCTURES FOR THERMOELECTRIC APPLICATIONS. American Journal of Technology and Applied Sciences, [S. l.], v. 28, p. 22–25, 2024. Disponível em: https://americanjournal.org/index.php/ajtas/article/view/2341. Acesso em: 1 may. 2026.